The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 1983
Filed:
Mar. 05, 1980
Applicant:
Inventors:
Koichiro Mizukami, Kokubunji, JP;
Masatoshi Migitaka, Kokubunji, JP;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
428203 ; 427165 ; 427269 ; 427109 ; 427 74 ; 428432 ; 428469 ; 428433 ; 428434 ; 428457 ; 428209 ; 428210 ;
Abstract
A photomask comprises a transparent film of conductive material and a light shielding film of predetermined pattern on a transparent substrate. The pattern film is made of a metallic element having its atomic number not smaller than 25 or a composition containing the metallic element. The photomask structure is suited to the case where the pattern formed on the mask is inspected with an electron beam. With the mask structure, the contrast of a pattern related information signal (backscattered electrons, secondary electrons, absorption current, etc.) derived from the mask upon irradiation thereof with the electron beam is improved.