This inventor holds 3 USPTO granted patents. Top assignee: Vlsi Technology Research Association. Active years: 1980-1983.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kodaira, JP (1980 - 1981)
- Kokubunji, JP (1983)
Company Filing History:
Years Active: 1980-1983
Title: Koichiro Mizukami: Innovator in Photomask Technology
Introduction
Koichiro Mizukami is a notable inventor based in Kodaira, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on enhancing the performance and inspection methods of photomasks used in various applications.
Latest Patents
Mizukami's latest patents include a novel photomask design. This photomask comprises a transparent film of conductive material and a light shielding film with a predetermined pattern on a transparent substrate. The pattern film is made of a metallic element with an atomic number not smaller than 25 or a composition containing this metallic element. This innovative structure is particularly suited for cases where the pattern formed on the mask is inspected with an electron beam. The design improves the contrast of pattern-related information signals derived from the mask when irradiated with an electron beam.
Another significant patent is a method of inspecting and retouching a photomask. This method involves preparing a photomask that has a conductive transparent substance on a major surface of an insulating substrate, along with a mask pattern of an opaque substance on the conductive transparent substance. The mask is then irradiated with an electron beam to inspect and/or retouch it, ensuring high precision in the manufacturing process.
Career Highlights
Koichiro Mizukami is associated with the VLSI Technology Research Association, where he continues to push the boundaries of photomask technology. His expertise and innovative approaches have made him a valuable asset in the field.
Collaborations
Mizukami collaborates with Masatoshi Migitaka, further enhancing the research and development efforts in photomask technology.
Conclusion
Koichiro Mizukami's contributions to photomask technology through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence advancements in the industry, showcasing the impact of dedicated inventors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile