The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 1980

Filed:

Nov. 21, 1978
Applicant:
Inventors:

Masatoshi Migitaka, Kokubunji, JP;

Koichiro Mizukami, Kodaira, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
250310 ; 250397 ;
Abstract

A method is disclosed in which an object picture such as an integrated circuit pattern is precisely and exactly detected at high speed by the use of an electron beam. At least two kinds of signals obtained by irradiating an object with an electron beam are detected and subjected to an adding/subtracting operation and a resulting signal is used to detect the object picture. Thus, a satisfactory S/N ratio can be obtained. The method is applicable to the inspection of a mask used for integrated circuits.


Find Patent Forward Citations

Loading…