The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1981
Filed:
Jul. 18, 1978
Applicant:
Inventors:
Koichiro Mizukami, Kodaira, JP;
Masatoshi Migitaka, Kokubunji, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 10 ; 427-9 ; 427 35 ; 427140 ;
Abstract
A method of treating a photo mask comprising preparing the photo mask which has a conductive transparent substance on a major surface of an insulating substrate and which is formed with a mask pattern of an opaque substance on the conductive transparent substance, and irradiating the mask with an electron beam to inspect and/or retouch said mask.