Yokohama, Japan

Masatoshi Koyama


Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Kanagawa, JP (2014)
  • Yokohama, JP (2015 - 2017)

Company Filing History:


Years Active: 2014-2017

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4 patents (USPTO):Explore Patents

Title: Masatoshi Koyama: Innovator in Semiconductor Technology

Introduction

Masatoshi Koyama is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative processes that enhance the performance and manufacturing of semiconductor devices.

Latest Patents

Koyama's latest patents include a groundbreaking process for forming nitride semiconductor devices. This process involves several steps, including the implantation of impurities into nitride semiconductor layers that are epitaxially grown on a substrate. Additionally, he has developed a method for manufacturing semiconductor devices that includes forming multiple active regions and an insulating layer, which is selectively opened through dry etching. These innovations are crucial for advancing semiconductor technology.

Career Highlights

Throughout his career, Masatoshi Koyama has worked with notable companies such as Sumitomo Electric Device Innovations, Inc. and Sumitomo Electric Industries, Limited. His experience in these organizations has allowed him to refine his expertise in semiconductor manufacturing and device innovation.

Collaborations

Koyama has collaborated with esteemed colleagues, including Kazuaki Matsuura and Tsutomu Komatani. These partnerships have contributed to the development of advanced semiconductor technologies and have fostered a collaborative environment for innovation.

Conclusion

Masatoshi Koyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of efficient and advanced semiconductor devices.

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