Masato Ishizaki

This inventor holds 9 USPTO granted patents and 1 published patent application, plus 4 CIPO patents and 2 EPO patents. Top assignees: Ihi Corporation, The University of Tokyo. Active years: 2017-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Ishizaki. Retrieved from https://idiyas.com/inventor/masato-ishizaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 (Patent Applications = 1)

% Patents Active = 100.0

CIPO Patents = 4

EPO Patents = 2 (Patent Applications = 4)

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 47(Granted Patents)

Location History:

Koto-ku, JP (2018 - 2019)
Tokyo, JP (2017 - 2023)

Company Filing History:

The University of Tokyo

patents

where one patent can have more than one assignee

Years Active: 2017-2023

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9 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11718569 - Production method for composite material (2023-08-08),

2. 11319212 - Method for stabilizing chlorosilane polymer (2022-05-03),

3. 10507414 - Reheating collection device for gas phase process (2019-12-17),

4. 10221104 - Heat-resistant composite material production method and production device (2019-03-05),

5. D839326 - Ingot mold (2019-01-29),

6. D834624 - Ingot mold (2018-11-27),

7. D833489 - Ingot mold (2018-11-13),

8. D809575 - Ingot mold (2018-02-06),

9. 9822445 - Method for manufacturing heat-resistant composite material (2017-11-21),

Title: Masato Ishizaki: Innovator in Composite Materials and Polymer Stabilization

Introduction

Masato Ishizaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of composite materials and polymer stabilization. With a total of 9 patents to his name, Ishizaki's work has had a notable impact on various industrial applications.

Latest Patents

Ishizaki's latest patents include a production method for composite material and a method for stabilizing chlorosilane polymer. The production method for composite material involves creating a silicon carbide film on a porous substrate through a reaction between silicon, chlorine, and carbon sources. This innovative approach enhances the properties of composite materials. The method for stabilizing chlorosilane polymer focuses on preventing the generation of solid chlorosilane polymers during chemical vapor deposition. This method utilizes alcohol to degrade the chlorosilane polymer, resulting in a more manageable alkoxide.

Career Highlights

Throughout his career, Ishizaki has worked with notable organizations such as IHI Corporation and The University of Tokyo. His experience in these institutions has allowed him to develop and refine his innovative techniques in material science.

Collaborations

Ishizaki has collaborated with esteemed colleagues, including Tsutomu Murakami and Akira Kobiki. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Masato Ishizaki's contributions to the fields of composite materials and polymer stabilization demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving industrial processes and materials.

Profile summary based on public USPTO records.