This inventor holds 3 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2022-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Suwon-si, KR (2022)
- Hwaseong-si, KR (2022)
Company Filing History:
Years Active: 2022-2025
Title: Masato Horiguchi: Innovator in Plasma Processing Equipment
Introduction
Masato Horiguchi is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of plasma processing equipment, holding a total of 3 patents. His work is instrumental in advancing technologies that utilize plasma for various applications.
Latest Patents
Horiguchi's latest patent focuses on plasma processing equipment. This innovative equipment includes a chuck stage designed to support a wafer, featuring a lower electrode and an upper electrode positioned on the chuck stage. An AC power supply applies first to third signals with varying magnitudes of frequencies to either the upper or lower electrode. Additionally, a dielectric ring surrounds the chuck stage, and an edge electrode is located within this ring. The resonance circuit connected to the edge electrode includes a filter circuit that permits only the third signal to pass among the first to third signals. Furthermore, a series resonance circuit, which consists of a first coil and a first variable capacitor connected in series and grounded, enhances the functionality of the equipment.
Career Highlights
Masato Horiguchi is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop advanced technologies. His expertise in plasma processing has positioned him as a key figure in the industry.
Collaborations
Horiguchi has collaborated with notable coworkers, including Seung Bo Shim and Doug Yong Sung. Their combined efforts contribute to the success of projects within Samsung Electronics.
Conclusion
Masato Horiguchi's contributions to plasma processing equipment exemplify his innovative spirit and dedication to advancing technology. His patents and collaborations reflect his significant impact in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
