The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
Jun. 29, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
Akira Koshiishi, Hwaseong-si, KR;
Masato Horiguchi, Suwon-si, KR;
Yongwoo Lee, Hwaseong-si, KR;
Kyohyeok Kim, Seoul, KR;
Dowon Kim, Jecheon-si, KR;
Yunhwan Kim, Hwaseong-si, KR;
Youngjin Noh, Ansan-si, KR;
Jongwoo Sun, Hwaseong-si, KR;
Taeil Cho, Daejeon, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A plasma processing apparatus includes a chamber, a lower and upper electrodes vertically spaced apart from each other in the chamber, a RF transmitting part connected to the lower electrode and configured to supply RF power to the lower electrode, a ground plate spaced downwardly from the lower electrode, and an insulating member laterally surrounding a cavity formed between the lower electrode and the ground plate. The cavity is isolated from a region under the ground plate by the ground plate.