The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Oct. 25, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Seung Bo Shim, Seoul, KR;
Doug Yong Sung, Seoul, KR;
Young Jin Noh, Ansan-si, KR;
Yong Woo Lee, Hwaseong-si, KR;
Ji Soo Im, Seongnam-si, KR;
Hyeong Mo Kang, Hwaseong-si, KR;
Peter Byung H Han, Suwon-si, KR;
Cheon Kyu Lee, Hwaseong-si, KR;
Masato Horiguchi, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
Plasma processing equipment includes a chuck stage for supporting a wafer and including a lower electrode, an upper electrode disposed on the chuck stage, an AC power supply which applies first to third signals having different magnitudes of frequencies to the upper electrode or the lower electrode, a dielectric ring which surrounds the chuck stage, an edge electrode located within the dielectric ring, and a resonance circuit connected to the edge electrode. The resonance circuit includes a filter circuit which allows only the third signal among the first to third signals to pass, and a series resonance circuit connected in series with the filter circuit and having a first coil and a first variable capacitor connected in series and grounded.