Company Filing History:
Years Active: 2022-2025
Title: Hyeong Mo Kang: Innovator in Plasma Processing Technology
Introduction
Hyeong Mo Kang is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work is primarily associated with Samsung Electronics Co., Ltd., where he continues to innovate and develop advanced technologies.
Latest Patents
One of Hyeong Mo Kang's latest patents involves plasma processing equipment. This equipment features a chuck stage designed to support a wafer, which includes a lower electrode and an upper electrode positioned on the chuck stage. An AC power supply applies first to third signals with varying magnitudes of frequencies to either the upper or lower electrode. Additionally, the design incorporates a dielectric ring surrounding the chuck stage, an edge electrode located within the dielectric ring, and a resonance circuit connected to the edge electrode. The resonance circuit is equipped with a filter circuit that permits only the third signal among the first to third signals to pass through. Furthermore, a series resonance circuit is connected in series with the filter circuit, consisting of a first coil and a first variable capacitor that are grounded.
Career Highlights
Hyeong Mo Kang has established himself as a key figure in the development of plasma processing technologies. His innovative designs and patents have contributed to advancements in the semiconductor industry, particularly in the manufacturing processes that require precise plasma applications.
Collaborations
Throughout his career, Hyeong Mo Kang has collaborated with esteemed colleagues such as Seung Bo Shim and Doug Yong Sung. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Hyeong Mo Kang's contributions to plasma processing technology exemplify his dedication to innovation and excellence. His patents and collaborations reflect his commitment to advancing the field and enhancing the capabilities of semiconductor manufacturing.