Location History:
- Gunma, JP (1992 - 1995)
- Takasaki, JP (1992 - 1998)
- Annaka, JP (1998)
- Tokyo, JP (1999)
- Gunma-ken, JP (1997 - 2001)
Company Filing History:
22 out of 1,100 
1 out of 7 
1 out of 5 Years Active: 1992-2001
Title: Innovations by Masatake Katayama in Semiconductor Thin Film Technology
Introduction
Masatake Katayama is a notable inventor hailing from Takasaki, Japan, with a remarkable portfolio of 24 patents. His groundbreaking works primarily focus on methods and apparatuses associated with the growth of semiconductor thin films, utilizing advanced chemical vapor deposition techniques.
Latest Patents
Katayama's latest innovations include a "Method of Chemical Vapor Deposition" that significantly enhances the production of semiconductor crystalline thin films with minimized transition widths. This method utilizes a cold-wall type reaction chamber, featuring a gas inlet and outlet, and supports a semiconductor substrate in a horizontal orientation. By directing the reactant gas horizontally through the chamber, it effectively promotes the growth of high-quality crystalline thin films on the substrate.
Another significant patent is the "Method and Apparatus for Thin Film Growth." This invention addresses the challenges of impurities and contaminants within the reaction vessel, which can severely affect thin film quality. Katayama's method employs a cooled wall of the reaction vessel while the substrate undergoes heating for thin film growth, ensuring that the internal conditions remain optimal for high-quality production.
Career Highlights
Throughout his career, Masatake Katayama has made substantial contributions while working at notable companies, including Shin-Etsu Handotai Co., Ltd. and Shin-Etsu Handotai Kabushiki Kaisha. His expertise and innovations have cemented his position as a leading figure in the semiconductor field.
Collaborations
Katayama has collaborated with esteemed colleagues, including Hitoshi Habuka and Yutaka Ohta. Their joint efforts in semiconductor technology have led to significant advancements and innovations that contribute to the overall evolution of the industry.
Conclusion
Masatake Katayama's contributions to semiconductor technology through his innovative patents and collaborative efforts reflect his dedication to advancing the field of thin film growth. His work continues to influence and inspire future innovations in semiconductor manufacturing.