Masashi Teramoto

Title: The Innovations of Masashi Teramoto

Introduction

Masashi Teramoto is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of polishing compositions, holding a total of eight patents. His work has been instrumental in advancing technologies related to semiconductor manufacturing.

Latest Patents

Among his latest patents is a polishing composition that includes hydroxyethyl cellulose, water, and abrasive grains. This composition is notable for its specific molecular weight range of hydroxyethyl cellulose, which is between 500,000 and 1,500,000. Additionally, the proportion of hydroxyethyl cellulose adsorbed to the abrasive grains is maintained between 30% and 90%. Another significant patent involves a polishing composition and method that does not contain abrasives, specifically designed for polishing silicon wafers. This innovative composition includes a pH buffer, a polishing accelerator, a water-soluble polymer, and a block-type compound, achieving a polishing speed greater than 0.1 µm/min.

Career Highlights

Masashi Teramoto has worked with notable companies such as Nitta Haas Inc. and Rohm and Haas Electronic Materials Cmp Holdings, Inc. His experience in these organizations has allowed him to refine his expertise in polishing technologies and materials.

Collaborations

Throughout his career, Teramoto has collaborated with esteemed colleagues, including Shinichi Haba and Tatsuya Nakauchi. These partnerships have contributed to the development of innovative solutions in the field.

Conclusion

Masashi Teramoto's contributions to polishing compositions and methods have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this specialized field.