Masaru Nanpei

Title: Masaru Nanpei: Innovator in Photosensitive Resin Technology

Introduction

Masaru Nanpei is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of photosensitive resin compositions, holding a total of 8 patents. His work has advanced the technology used in printing plates and other applications.

Latest Patents

One of Nanpei's latest patents involves a photosensitive resin composition that includes several key components. This composition consists of a hydrophobic polymer with a glass transition temperature not greater than 5°C, a hydrophilic polymer, an ethylenically unsaturated compound, a solvent that dissolves the hydrophilic polymer more than the hydrophobic one, and a photopolymerization initiator. The resin composition is designed to prepare a printing plate that features a base, a photosensitive resin layer, and a covering layer arranged in succession. The photosensitive resin layer contains a dispersed phase with particles of the hydrophobic polymer surrounded by the hydrophilic polymer. The preparation of this layer involves removing the solvent to a content of 0.001-2% by weight.

Career Highlights

Throughout his career, Masaru Nanpei has worked with prominent companies such as Toyo Boseki Kabushiki Kaisha and Toyobo Co., Ltd. His experience in these organizations has contributed to his expertise in the development of innovative materials and technologies.

Collaborations

Nanpei has collaborated with notable coworkers, including Kuniomi Etoh and Keizo Kawahara. Their joint efforts have furthered advancements in the field of photosensitive resins.

Conclusion

Masaru Nanpei's contributions to the field of photosensitive resin technology have established him as a key figure in innovation. His patents and collaborations reflect his commitment to advancing materials science and technology.