Masaru Hatabe

Title: Masaru Hatabe: A Kobe-Based Innovator with Two Remarkable Patents

Introduction:

In the bustling city of Kobe, Japan, lies an incredible innovator by the name of Masaru Hatabe. With a passion for technological advancement and a keen eye for inventive solutions, Hatabe has made significant contributions in the field of material science. Two of his latest patents showcase his ingenious approach towards creating novel structures and manufacturing methods. Let us delve deeper into Masaru Hatabe's innovations and career highlights.

Latest Patents:

1. Structure containing Sn layer or Sn alloy layer:

This patent introduces a ground-breaking structure consisting of a substrate, a tin (Sn) layer or its alloy layer, and an under barrier metal positioned between the substrate and the Sn layer. Notably, the under barrier metal is composed of a single metal layer, incorporating elements such as iron (Fe), cobalt (Co), ruthenium (Ru), or palladium (Pd). This innovative design opens up possibilities for improved compatibility and performance of electronic components.

2. Method for manufacturing alloy bump:

Hatabe's second patent focuses on a method for producing an alloy bump. The method involves forming a resist pattern with openings on the substrate, depositing an under-bump metal within these openings, electroplating a first plating film onto the under-bump metal, electroplating a second plating film without the metal components found in the first plating film, removing the resist pattern, and finally heat treating the substrate to alloy the first and second plating films. This patented process offers a reliable and efficient approach for manufacturing alloy bumps.

Career Highlights:

Masaru Hatabe has demonstrated unwavering dedication to innovative research and development throughout his career. His contributions within Ishihara Chemical Co., Ltd. have played a vital role in the company's growth and technological advancements. Hatabe's exemplary project collaborations and expertise in material science have paved the way for groundbreaking discoveries and patents.

Collaborations:

Within Ishihara Chemical Co., Ltd., Hatabe has had the pleasure of working alongside talented individuals such as Shoya Iuchi and Takahiro Tanaka. These collaboration efforts have not only fostered a fruitful work environment but have also resulted in innovative solutions and improved research methodologies. Through collaborative teamwork, these inventors have pushed the boundaries of knowledge and research in their respective fields.

Conclusion:

Masaru Hatabe, a prominent innovator from Kobe, Japan, is making significant strides in the field of material science with his two latest patents. With his passion for technological advancement and unwavering dedication to his work, Hatabe has made notable contributions to the industry. As a valued member of Ishihara Chemical Co., Ltd., he continues to collaborate with talented colleagues to push the boundaries of innovation. We eagerly anticipate Hatabe's future inventions, which are certain to shape the landscape of technological advancements further.