Masao Oono

Title: Innovations of Masao Oono in Substrate Drying Technology

Introduction

Masao Oono is a notable inventor based in Sakai, Japan, recognized for his contributions to substrate drying technology. With a total of three patents to his name, Oono has developed innovative methods and devices that enhance the efficiency of drying substrates, particularly in semiconductor manufacturing.

Latest Patents

Oono's latest patents include a method and device for drying substrates. This device features a processing vessel that houses a specified number of substrates, such as semiconductor wafers, installed in parallel. It includes a first substrate supporting member, a processing fluid supplying section, and a processing fluid exhausting section. Additionally, it has a drying fluid supplying section that introduces liquid drops of drying fluid to perform drying processing on the substrates. Another patent describes a device that stores multiple substrates and comprises a processing container for draining cleaning fluid after cleaning the substrates. This design simplifies or eliminates the need for exhaust equipment, allowing for smooth feeding of the drying fluid.

Career Highlights

Throughout his career, Masao Oono has worked with prominent companies, including Daikin Industries, Ltd. and Toho Kasei Ltd. His experience in these organizations has contributed to his expertise in developing advanced drying technologies.

Collaborations

Oono has collaborated with notable colleagues, including Norio Maeda and Hiroshi Aihara. Their joint efforts have likely played a significant role in the development of innovative solutions in the field of substrate drying.

Conclusion

Masao Oono's work in substrate drying technology showcases his innovative spirit and dedication to improving manufacturing processes. His patents reflect significant advancements that benefit the semiconductor industry and beyond.