Company Filing History:
5 out of 1,258 
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Years Active: 2014-2019
Title: Masanao Fukuda - Innovator in Semiconductor Processing
Introduction
Masanao Fukuda is a notable inventor based in Toyama-shi, Japan. He has made significant contributions to the field of semiconductor processing, focusing on methods that enhance the uniformity of thin films on substrates. His innovative approaches aim to improve the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patent Applications
Masanao Fukuda has filed several latest patent applications, including a semiconductor processing apparatus. This apparatus features a processing tube designed to house a substrate support member that accommodates multiple substrates stacked vertically. It includes a gas supply part with multiple openings, an exhaust part, and a gas rectifying plate that ensures uniform gas flow around the substrates. Additionally, he has developed a method for manufacturing semiconductor devices that controls the concentration of atomic oxygen at low temperatures, ensuring uniform thickness distribution of oxide films on the substrates.
Conclusion
Masanao Fukuda's work in semiconductor processing showcases his commitment to innovation in the field. His latest patent applications reflect his dedication to improving manufacturing techniques and enhancing the quality of semiconductor devices.