The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

Aug. 02, 2011
Applicants:

Kazuhiro Yuasa, Takaoka, JP;

Masanao Fukuda, Toyama, JP;

Takafumi Sasaki, Toyama, JP;

Yasuhiro Megawa, Toyama, JP;

Masayoshi Minami, Toyama, JP;

Inventors:

Kazuhiro Yuasa, Takaoka, JP;

Masanao Fukuda, Toyama, JP;

Takafumi Sasaki, Toyama, JP;

Yasuhiro Megawa, Toyama, JP;

Masayoshi Minami, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/3105 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02104 (2013.01); H01L 21/3105 (2013.01); H01L 21/02238 (2013.01); H01L 21/02255 (2013.01); H01L 21/67017 (2013.01);
Abstract

An oxygen-containing gas and a hydrogen-containing gas are supplied into a pre-reaction chamber heated to a second temperature and having the pressure set to less than an atmospheric pressure, and a reaction is induced between both gases in the pre-reaction chamber to generate reactive species, and the reactive species are supplied into the process chamber and exhausted therefrom, in which a substrate heated to the first temperature is housed and the pressure is set to less than the atmospheric pressure, and processing is applied to the substrate by the reactive species, with the second temperature set to be not less than the first temperature at this time.


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