The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Feb. 24, 2011
Yukitomo Hirochi, Toyama, JP;
Akinori Tanaka, Toyama, JP;
Akihiro Sato, Toyama, JP;
Takeshi Itoh, Toyama, JP;
Daisuke Hara, Toyama, JP;
Kenji Shirako, Toyama, JP;
Kazuhiro Morimitsu, Toyama, JP;
Masanao Fukuda, Toyama, JP;
Yukitomo Hirochi, Toyama, JP;
Akinori Tanaka, Toyama, JP;
Akihiro Sato, Toyama, JP;
Takeshi Itoh, Toyama, JP;
Daisuke Hara, Toyama, JP;
Kenji Shirako, Toyama, JP;
Kazuhiro Morimitsu, Toyama, JP;
Masanao Fukuda, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
There are provided a substrate processing apparatus capable of suppressing leakage of magnetic field during processing of a substrate. The substrate processing apparatus of the present invention includes: a reaction tube having a processing chamber provided therein to process a substrate; an induction heating unit installed outside of the reaction tube to accommodate the reaction tube, wherein the induction heating unit is configured to electromagnetically induction-heat the processing chamber by generating a magnetic field; an accommodation tube installed outside of the induction heating unit to accommodate the induction heating unit, wherein the accommodation tube accommodates the reaction tube and the induction heating unit in an air-tight manner; a shielding unit made of a conductive material installed to surround an outside of the accommodation tube; and an inert gas supply unit installed in a gap between the reaction tube and the accommodation tube where the induction heating unit is installed, wherein the inert gas supply unit is configured to supply an inert gas into the gap.