Location History:
- Oshu, JP (2022)
- Iwate, JP (2016 - 2024)
Company Filing History:
Years Active: 2016-2025
Title: Masami Oikawa: Innovator in Cleaning Technologies
Introduction
Masami Oikawa is a prominent inventor based in Iwate, Japan. She has made significant contributions to the field of cleaning technologies, holding a total of 13 patents. Her innovative approaches have advanced the efficiency and effectiveness of cleaning processes in various applications.
Latest Patents
Oikawa's latest patents include a cleaning method and a substrate processing apparatus. The cleaning method involves supplying a halogen-containing gas that does not contain fluorine to a processing container, followed by the introduction of a fluorine-containing gas to enhance the cleaning process. The substrate processing apparatus features a processing container equipped with a temperature sensor, a gas supply unit, and a pressure regulation unit. This apparatus is designed to remove deposited films effectively by controlling the pressure based on a vapor pressure curve associated with the temperature in the processing container.
Career Highlights
Masami Oikawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. Her work focuses on developing advanced cleaning technologies that are crucial for maintaining the integrity of semiconductor manufacturing processes.
Collaborations
Oikawa has collaborated with notable colleagues, including Yoshinori Kusakabe and Tomoya Hasegawa. These collaborations have fostered innovation and contributed to the development of cutting-edge cleaning solutions.
Conclusion
Masami Oikawa's contributions to cleaning technologies exemplify her dedication to innovation and excellence in her field. Her patents and collaborative efforts continue to influence the industry positively.