Company Filing History:

20 out of 52,751

Kabushiki Kaisha Toshiba

patents

2 out of 164,219

International Business Machines Corporation

patents

2 out of 30,052

Siemens Aktiengesellschaft

patents

where one patent can have more than one assignee

Years Active: 1995-2010

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20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7732338 - Method of fabricating semiconductor device with reduced pitch (2010-06-08),

2. 7208400 - Method of manufacturing a semiconductor device including a dielectric film formed between first and second electrode layers (2007-04-24),

3. 7067761 - Semiconductor device manufacturing system for etching a semiconductor by plasma discharge (2006-06-27),

4. 6989073 - Semiconductor device manufacturing system for etching a semiconductor by plasma discharge (2006-01-24),

5. 6911398 - Method of sequentially processing a plurality of lots each including semiconductor substrates (2005-06-28),

6. 6887802 - Method of manufacturing semiconductor device and semiconductor device (2005-05-03),

7. 6685797 - Semiconductor device manufacturing system for etching a semiconductor by plasma discharge (2004-02-03),

8. 6383942 - Dry etching method (2002-05-07),

9. 6376347 - Method of making gate wiring layer over semiconductor substrate (2002-04-23),

10. 6368977 - Semiconductor device manufacturing method (2002-04-09),

11. 6333246 - Semiconductor device manufacturing method using electrostatic chuck and semiconductor device manufacturing system (2001-12-25),

12. 6313535 - Wiring layer of a semiconductor integrated circuit (2001-11-06),

13. 6274507 - Plasma processing apparatus and method (2001-08-14),

14. 6270948 - Method of forming pattern (2001-08-07),

15. 6025117 - Method of forming a pattern using polysilane (2000-02-15),

Title: Innovations by Masaki Narita in Semiconductor Fabrication

Introduction

Masaki Narita is a renowned inventor based in Yokohama, Japan, known for his significant contributions to semiconductor technology. With a remarkable portfolio of 20 patents, he has played a pivotal role in advancing semiconductor device manufacturing processes.

Latest Patents

Narita's recent innovations include a method of fabricating semiconductor devices with reduced pitch. This intricate process involves several steps: depositing a first film on a workpiece, using resist as a mask for processing, and sequentially depositing additional films that enhance the structural integrity of the device. His other notable patent is focused on manufacturing a semiconductor device featuring a dielectric film formed between the first and second electrode layers. This method includes creating a gate dielectric film on a semiconductor substrate and incorporates a complex design of electrode layers to optimize device performance.

Career Highlights

Throughout his career, Narita has worked with prestigious organizations that have championed technological advancements. He has been associated with major companies such as Kabushiki Kaisha Toshiba and IBM, where he has developed innovative solutions that have shaped the semiconductor industry. His extensive experience in these leading firms highlights his expertise and dedication to innovation.

Collaborations

Masaki Narita has collaborated with notable colleagues such as Katsuya Okumura and Yukimasa Yoshida. These partnerships have resulted in groundbreaking inventions and have significantly impacted the field of semiconductor technology.

Conclusion

Masaki Narita's contributions to the semiconductor industry are a testament to his exceptional talent and innovative spirit. With a solid foundation of patents, he continues to influence the future of semiconductor fabrication, paving the way for new advancements in technology. His work not only showcases individual brilliance but also highlights the importance of collaboration in driving innovation forward.

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