The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2002
Filed:
Mar. 09, 2000
Applicant:
Inventors:
Masaki Narita, Yokohama, JP;
Hiroshi Sugiura, Yokkaichi, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
A dry etching method is disclosed for use in patterning a stacked film of a metal film containing aluminum as the base component and a thin film including at least one of titanium and titanium nitride. In this method, the thin film is dry-etched using a first etching gas (a mixture of CF gas, Ar gas and Cl gas) having a gas composition for preventing the metal film from being processed. The metal film is then dry-etched using a second etching gas (a mixture of Cl gas and BCl gas) having a gas composition other than the first etching gas.