Masakazu Saito

Title: Masakazu Saito: Innovator in Active Matrix Substrate Technology

Introduction

Masakazu Saito is a prominent inventor based in Mobara, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of active matrix substrates for image display devices. With a total of 13 patents to his name, Saito's work has had a lasting impact on the industry.

Latest Patents

Saito's latest patents include a method of manufacturing an active matrix substrate and an image display device using the same. This invention provides a manufacturing method for a high-performance active matrix substrate at a high throughput with a less expensive apparatus. The process involves carrying a glass substrate with an amorphous silicon semiconductor film formed on it, while utilizing a pulsed laser beam to crystallize the film. Another notable patent is related to the semiconductor thin film and the process for its production. This invention aims to improve the laser annealing process for polycrystallizing amorphous silicon, allowing for the formation of silicon thin films with large crystal particle diameters at a high throughput.

Career Highlights

Throughout his career, Masakazu Saito has worked with notable companies such as Hitachi, Ltd. and Hitachi Displays, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Saito has collaborated with esteemed colleagues, including Kazuo Takeda and Makoto Ohkura. These partnerships have further enhanced his research and development efforts in the field.

Conclusion

Masakazu Saito's innovative work in active matrix substrate technology and semiconductor processes has established him as a key figure in the industry. His contributions continue to influence advancements in image display devices and semiconductor technology.