Masakazu Kume

Title: Masakazu Kume: Innovator in Photosensitive Technology

Introduction

Masakazu Kume is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive technology, holding a total of 3 patents. His work focuses on developing advanced materials and methods for manufacturing printed wiring boards and resist patterns.

Latest Patents

Kume's latest patents include a photosensitive element that comprises a support film, a barrier layer, and a photosensitive layer. The barrier layer contains a water-soluble resin and an ultraviolet absorber. Additionally, he has developed a method for forming a resist pattern that enhances the quality of resist shapes while reducing resist footing. This method involves forming a photosensitive resin layer on a substrate, exposing it to active light, and developing the layer to remove unexposed parts. His innovations also include a photosensitive resin composition for projection exposure, which ensures a light transmittance of the photosensitive resin layer at a wavelength of 365 nm between 58.0% and 95.0%.

Career Highlights

Throughout his career, Masakazu Kume has worked with notable companies such as Hitachi Chemical Company, Ltd. and Resonac Corporation. His experience in these organizations has allowed him to refine his expertise in photosensitive materials and manufacturing processes.

Collaborations

Kume has collaborated with several professionals in his field, including Momoko Munakata and Hiroshi Ono. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Masakazu Kume's innovative work in photosensitive technology has led to significant advancements in the manufacturing of printed wiring boards and resist patterns. His contributions continue to influence the industry and pave the way for future innovations.