Masahiro Shiosaki

Title: The Innovative Contributions of Masahiro Shiosaki

Introduction

Masahiro Shiosaki is a noted inventor based in Kawasaki, Japan, known for his significant contributions to the field of resist compositions used in lithography. With a portfolio of three patents to his name, Shiosaki's work is instrumental in advancing technologies related to microlithography processes.

Latest Patents

Shiosaki's latest patents include a resist composition, a method of forming resist patterns, and an acid diffusion-controlling agent. The first patent details a resist composition that generates acid upon exposure, with its solubility in a developing solution altered by the interaction of the acid. This composition incorporates a base material whose solubility is also affected by the acid. The compound is represented by a specific general formula consisting of organic groups and linking structures.

The second patent focuses on a resist composition containing compounds defined by intricate chemical formulas. These compounds feature hydrocarbon groups, potential ring structures, and anions. Critical to this patent is the inclusion of a sulfonium cation along with organic groups with acid-dissociable properties, enhancing the development of resistant materials in photolithography.

Career Highlights

Masahiro Shiosaki is employed at Tokyo Ohka Kogyo Co., Ltd., a reputable company involved in the production of semiconductor materials and solutions. His innovative work at the company aligns with the organization's mission to drive advancements in semiconductor processing technologies.

Collaborations

Throughout his career, Shiosaki has collaborated with esteemed colleagues such as Takuya Ikeda and Masatoshi Arai. These partnerships not only foster innovation but also contribute to the successful outcome of complex projects within the realm of resist technology.

Conclusion

Masahiro Shiosaki stands out as a prominent figure in the field of microfabrication, with his patented innovations significantly impacting the industry. His continued dedication and research efforts promise to further enhance the capabilities of resist compositions, addressing the needs of evolving technological landscapes.