Tokyo Ohka Kogyo Co., Ltd.

Masahiro Shiosaki

Masatoshi Arai

Yoshitaka Komuro

Takuya Ikeda

Takaya Maehashi

Koshi Onishi

KhanhTin Nguyen

Hiroto Yamazaki

Nobuhiro Michibayashi

Seiji Todoroki

A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rdrepresents a monovalent organic group, Rdrepresents a single bond or a divalent linking group, m represents an integer of 1 or greater, and Mrepresents an m-valent organic cation

Resist composition, method of forming resist pattern, and acid diffusion-controlling agent

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, Mrepresents a sulfonium cation having a sulfonyl group, Rto Reach independently represent a monovalent organic group; provided that at least one of Rto Ris an organic group having an acid dissociable group; and Mrepresents an m-valent organic cation having an electron-withdrawing group. 

Resist composition, method of forming resist pattern, compound, and acid generator

A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, Rand Rare each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Vais a divalent hydrocarbon group which may have an ether bond, nis an integer of 0 to 2, Rais a tertiary alkyl ester-type acid dissociable group, Vais a divalent linking group containing a heteroatom, or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, Rais an acid dissociable group, and nis an integer of 1 to 3. 

Method of preparing polymer compound

Growing community of inventors

Kawasaki, Japan

Masahiro Shiosaki