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For the Inventor, By the Inventor

Hitachi, Japan

Masahiro Miyasaka

This inventor holds 10 USPTO granted patents. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2009-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Miyasaka. Retrieved from https://idiyas.com/inventor/masahiro-miyasaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 60.0

Average Co-Inventor Count = 2.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Hitachi, JP (2009 - 2013)
  • Tokyo, JP (2018)

Company Filing History:

goldMedal10 out of 1,641 
 
Hitachi Chemical Company, Ltd.
 patents

Years Active: 2009-2018

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10 patents (USPTO):Explore Patents
1. 10104781 - Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board (2018-10-16),
2. 8592130 - Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board (2013-11-26),
3. 8586284 - Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board (2013-11-19),
4. 8501392 - Photosensitive element, method for formation of resist pattern, and method for production of print circuit board (2013-08-06),
5. 8198008 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board (2012-06-12),
6. 8192916 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board (2012-06-05),
7. 8105759 - Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition (2012-01-31),
8. 7993809 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board (2011-08-09),
9. 7736834 - Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product (2010-06-15),
10. 7622243 - Photosensitive element, resist pattern formation method and printed wiring board production method (2009-11-24),

Title: Masahiro Miyasaka: A Pioneer in Photosensitive Technology

Introduction

Masahiro Miyasaka is an accomplished inventor based in Hitachi, Japan. With a portfolio of 10 patents, he has made significant contributions to the field of photopolymer technology. His work has influenced various applications, particularly in the manufacturing of printed wiring boards.

Latest Patents

Miyasaka's latest patents focus on innovative advancements in photosensitive resin compositions and related methodologies. His work includes a detailed formulation of a photosensitive resin composition that comprises a binder polymer, a photopolymerizable compound, and a photopolymerization initiator. The unique binder polymer features structural units derived from (meth)acrylic acid, styrene or α-methylstyrene, and hydroxyalkyl (meth)acrylate esters. Additionally, he has developed methods for forming resist patterns and producing printed wiring boards, showcasing his commitment to enhancing the efficiency and effectiveness of electronic component manufacturing.

Career Highlights

Miyasaka has built a respected career at Hitachi Chemical Company, Ltd., where he has actively engaged in cutting-edge research and development. His dedication to innovation is reflected in his multiple patents, which underscore his expertise in the realm of photopolymers and their applications in technology.

Collaborations

Throughout his career, Miyasaka has collaborated with esteemed colleagues, including Takashi Kumaki and Yukiko Muramatsu. These collaborations have allowed for a diverse exchange of ideas and methodologies, further enriching the innovative landscape of their work.

Conclusion

Masahiro Miyasaka stands out as an influential inventor in the field of photosensitive technology. His significant contributions through his patents and collaborations have paved the way for advancements in electronic manufacturing processes. As technology continues to evolve, Miyasaka's work remains at the forefront of innovation, promising exciting developments for the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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