Fujisawa, Japan

Masaharu Aoyama


Average Co-Inventor Count = 3.2

ph-index = 13

Forward Citations = 1,054(Granted Patents)


Location History:

  • Yokohama, JP (1980 - 1985)
  • Fujisawa, JP (1984 - 1993)

Company Filing History:


Years Active: 1980-1993

Loading Chart...
19 patents (USPTO):Explore Patents

Title: Innovations by Masaharu Aoyama: Pioneering Semiconductor Technologies

Introduction: Masaharu Aoyama, based in Fujisawa, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 19 patents, Aoyama's work focuses on improving semiconductor device manufacturing processes, particularly in the areas of wiring methods and thin film control.

Latest Patents: Among his most recent innovations, Aoyama has developed a patent for a method of forming trench buried wiring for semiconductor devices. This methodology involves creating a trench in a first insulating film on a semiconductor substrate using a photoresist layer as a mask. The process details the subsequent deposition and selective removal of electrode materials to form a composite electrode, enhancing the efficiency of semiconductor devices. Another notable patent addresses the control of metal thin film formation conditions by measuring temperature and internal stress characteristics of aluminum thin films formed on silicon substrates. This breakthrough allows for the adjustment of impurity levels in the thin film atmosphere, optimizing material properties for better device performance.

Career Highlights: Throughout his career, Aoyama has worked with prominent companies in the technology sector, including Tokyo Shibaura Denki (commonly known as Toshiba) and Toshiba Corporation. His expertise and innovative mindset have positioned him as a key figure in advancing semiconductor technology.

Collaborations: Masaharu Aoyama has collaborated with esteemed colleagues such as Masahiro Abe and Toshio Yonezawa. Their joint efforts in research and development have contributed to the successful realization of several groundbreaking patents in the industry.

Conclusion: Masaharu Aoyama's contributions to semiconductor technology through his numerous patents underscore the importance of innovation in this critical field. His methodologies not only enhance semiconductor device manufacturing but also pave the way for future advancements in technology. Aoyama’s work exemplifies the synergy between inventive spirit and practical application, making a lasting impact on the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…