Company Filing History:
15 out of 309 
1 out of 1 Years Active: 2006-2014
Title: Mary Jo Kulp: Innovator in Polishing Pad Technology
Introduction
Mary Jo Kulp is a distinguished inventor based in Newark, DE (US), known for her significant contributions to the field of polishing pad technology. With a remarkable portfolio of 16 patents, she has developed innovative solutions that enhance the efficiency and effectiveness of polishing processes in various industries.
Latest Patents
Among her latest inventions is the "Creep-resistant polishing pad window." This polishing pad is designed for use with magnetic, optical, and semiconductor substrates. It features a polyurethane window with a cross-linked structure, which is formed using an aliphatic or cycloaliphatic isocyanate and a polyol in a prepolymer mixture. The unique properties of this window include a time-dependent strain of less than or equal to 0.02% under specific conditions, a Shore D hardness ranging from 45 to 90, and an optical double pass transmission of at least 15% at a wavelength of 400 nm.
Another notable invention is the "Multi-functional polishing pad," which is suitable for polishing patterned semiconductor substrates that contain materials such as copper, dielectric, barrier, and tungsten. This polishing pad consists of a polymeric matrix that is a polyurethane reaction product of a polyol blend, a polyamine or polyamine mixture, and toluene diisocyanate. The specific formulation of the polyol blend and the proportions of the components contribute to the pad's effectiveness in various polishing applications.
Career Highlights
Mary Jo Kulp has worked with several prominent companies throughout her career, including Rohm and Haas, Electronic Materials CMP Holdings, Inc., and Materials CMP Holdings, Inc. Her experience in these organizations has allowed her to refine her expertise in materials science and polishing technologies.
Collaborations
Throughout her career, Mary Jo has collaborated with notable colleagues, including David B. James and Adam Loyack. These partnerships have contributed to her innovative work and the development of her patented technologies.
Conclusion
Mary Jo Kulp's contributions to polishing pad technology exemplify her dedication to innovation and excellence in her field. Her patents reflect her commitment to advancing the capabilities of polishing processes, making her a significant figure in the industry.