The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2008
Filed:
Apr. 04, 2006
Applicants:
David B. James, Newark, DE (US);
Mary JO Kulp, Newark, DE (US);
John V. H. Roberts, Newark, DE (US);
Inventors:
David B. James, Newark, DE (US);
Mary Jo Kulp, Newark, DE (US);
John V. H. Roberts, Newark, DE (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C 44/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a method of forming a chemical mechanical polishing pad comprising providing a polymeric matrix with fluid-filled unexpanded microspheres, curing the polymeric matrix and heating the polymeric matrix and the microspheres to expand the microspheres.