Aalen, Germany

Martin Scheid

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Scheid. Retrieved from https://idiyas.com/inventor/martin-scheid

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Martin Scheid - Innovator in Optical Technology

Introduction

Martin Scheid is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of optical technology, particularly through his innovative patent related to diffractive optical elements.

Latest Patents

Scheid holds a patent for a diffractive optical element designed for a test interferometer. This invention measures the shape of an optical surface by utilizing diffractive shape measuring structures arranged on the surface of the element. These structures generate a test wave that irradiates the surface when positioned in the interferometer. The patent includes a test field that evaluates several profile properties of the test structures, such as flank angle, profile depth, and microtrench depth.

Career Highlights

Martin Scheid is associated with Carl Zeiss SMT GmbH, a leading company in the field of optical systems. His work at this esteemed organization has allowed him to develop and refine his innovative ideas in optical technology.

Collaborations

Scheid has collaborated with notable colleagues, including Alexander Winkler and Hans Michael Stiepan, who have contributed to his projects and innovations.

Conclusion

Martin Scheid's contributions to optical technology through his patent and work at Carl Zeiss SMT GmbH highlight his role as an influential inventor in the field. His innovative approaches continue to shape advancements in optical measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…