Cupertino, CA, United States of America

Martin L Hammond

This inventor holds 5 USPTO granted patents. Top assignees: Mattson Technology, Inc, Tetron, Inc.. Active years: 1987-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin L Hammond. Retrieved from https://idiyas.com/inventor/martin-l-hammond

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 390(Granted Patents)


Company Filing History:


Years Active: 1987-2003

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Martin L Hammond

Introduction

Martin L Hammond, based in Cupertino, California, is an accomplished inventor with a remarkable portfolio that includes five patents. His work primarily focuses on advancements in semiconductor processing, contributing significantly to the field through innovative technologies and methods. His inventions showcase a deep understanding of plasma reactors and cleaning systems used in various processes.

Latest Patents

Among Martin's latest patents is the development of an inductive plasma reactor. This invention describes a plasma reactor and methods for processing semiconductor wafers where gases are introduced into a reactor chamber. An induction coil surrounds this chamber, and applying RF power to it creates a plasma through inductive coupling. A unique feature of this reactor is the inclusion of a split Faraday shield, which effectively blocks capacitive coupling of energy, allowing for modulation of the plasma potential. Additionally, for etching processes, a separate powered electrode may be utilized to direct ions towards a wafer surface, enhancing precision. For isotropic etching processes, the invention allows for the filtering of charged particles from the gas flow while enabling neutral activated species to reach the wafer unimpeded.

Another significant innovation from Martin is a cleaning process for rapid thermal processing systems, designed for in-situ cleaning of hot wall RTP systems. This method involves heating internal components above 500°C and flowing a combination of halocarbon gas, inert gas, and oxidizing gas through the reactor for a duration that may exceed 20 minutes, before purging to remove any contaminants.

Career Highlights

Throughout his career, Martin L Hammond has held key positions at notable technology companies, including Mattson Technology, Inc. and Tetron, Inc. His experience within these organizations has played a crucial role in shaping his inventive contributions and enhancing his expertise in semiconductor technologies.

Collaborations

Martin has worked alongside esteemed colleagues in the field, including Stephen E Savas and Brad S Mattson. These collaborations have enriched his work and expanded the impact of his inventions.

Conclusion

Martin L Hammond stands out as a prominent inventor whose contributions have significantly advanced semiconductor processing technologies. With a focus on innovative plasma reactors and efficient cleaning processes, his work continues to influence the industry, evidencing the importance of continuous innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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