Martin Eibelhuber

Title: Martin Eibelhuber: Innovator in Metrology and Semiconductor Technology

Introduction

Martin Eibelhuber is a notable inventor based in Ried im Innkreis, Austria. He has made significant contributions to the fields of metrology and semiconductor technology. With a total of 2 patents, Eibelhuber's work showcases his innovative approach to solving complex technical challenges.

Latest Patents

Eibelhuber's latest patents include a metrology device and a metrology method. The metrology device features a sound sample holder and an optical system designed to apply sound waves to a substrate stack surface. The optical system consists of a source that outputs electromagnetic radiation, which is divided into multiple beam paths. This device is equipped with a lens field for directing the first beam path to the measuring surface of the substrate stack, a beam splitter for creating interference radiation, and a detector for capturing this interference. Additionally, his method for applying a masked overgrowth layer onto a seed layer is crucial for producing semiconductor components. This method involves imprinting a mask onto the seed layer to effectively manage the overgrowth layer.

Career Highlights

Eibelhuber is currently employed at EV Group E. Thallner GmbH, where he continues to develop innovative solutions in his field. His work at this company has allowed him to push the boundaries of technology and contribute to advancements in metrology and semiconductor manufacturing.

Collaborations

Throughout his career, Eibelhuber has collaborated with talented individuals such as Markus Heilig and Boris Povazay. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Martin Eibelhuber stands out as a prominent inventor in the realms of metrology and semiconductor technology. His patents reflect his commitment to advancing these fields and his ability to innovate effectively.