The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
May. 21, 2015
Applicant:
Ev Group E. Thallner Gmbh, St. Florian am Inn, AT;
Inventors:
Gerald Kreindl, Scharding, AT;
Harald Zaglmayr, Leonding, AT;
Martin Eibelhuber, Ried im Innkreis, AT;
Assignee:
EV GROUP E. THALLNER GMBH, St. Florian am Inn, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 (2006.01); G03F 7/00 (2006.01); C30B 23/04 (2006.01); C30B 25/04 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C30B 23/04 (2013.01); C30B 25/04 (2013.01); H01L 21/0242 (2013.01); H01L 21/02381 (2013.01); H01L 21/02433 (2013.01); H01L 21/02439 (2013.01); H01L 21/02521 (2013.01); H01L 21/02642 (2013.01); H01L 21/02647 (2013.01);
Abstract
A method for applying a masked overgrowth layer onto a seed layer for producing semiconductor components, characterized in that a mask for masking the overgrowth layer is imprinted onto the seed layer.