Ev Group E. Thallner Gmbh

Martin Eibelhuber

Gerald Kreindl

Boris Povazay

Harald Zaglmayr

Markus Heilig

A metrology device includes a sound sample holder and an optical system. The sound sample holder is provided for applying sound waves to a first substrate stack surface of the substrate stack. The optical system include a source, a lens field, a beam splitter, and a detector. The source is provided for outputting electromagnetic radiation, which is split into at least one first beam path and one second beam path. The lens field is provided for applying the first beam path to a substrate stack measuring surface of the substrate stack. The beam splitter is provided for forming an interference radiation made up of the first and second beam paths of the electromagnetic radiation. The detector is provided for detecting the interference radiation.

Metrology device and metrology method

A method for applying a masked overgrowth layer onto a seed layer for producing semiconductor components, characterized in that a mask for masking the overgrowth layer is imprinted onto the seed layer.

Growing community of inventors

Ried im Innkreis, Austria

Martin Eibelhuber