The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Feb. 17, 2016
Applicant:

Ev Group E. Thallner Gmbh, St. Florian am Inn, AT;

Inventors:

Martin Eibelhuber, Ried im Innkreis, AT;

Markus Heilig, Neuburg a. Inn, DE;

Boris Povazay, Vienna, AT;

Assignee:

EV Group E. Thallner GmbH, St. Florian am Inn, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/17 (2006.01); G01H 9/00 (2006.01); G01N 29/24 (2006.01); G01N 21/88 (2006.01); G01N 21/45 (2006.01);
U.S. Cl.
CPC ...
G01N 21/1702 (2013.01); G01H 9/00 (2013.01); G01N 21/1717 (2013.01); G01N 21/8806 (2013.01); G01N 29/2418 (2013.01); G01N 21/45 (2013.01); G01N 21/88 (2013.01); G01N 2021/1706 (2013.01);
Abstract

A metrology device includes a sound sample holder and an optical system. The sound sample holder is provided for applying sound waves to a first substrate stack surface of the substrate stack. The optical system include a source, a lens field, a beam splitter, and a detector. The source is provided for outputting electromagnetic radiation, which is split into at least one first beam path and one second beam path. The lens field is provided for applying the first beam path to a substrate stack measuring surface of the substrate stack. The beam splitter is provided for forming an interference radiation made up of the first and second beam paths of the electromagnetic radiation. The detector is provided for detecting the interference radiation.


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