Veldhoven, Netherlands

Martijn Petrus Christianus Van Heumen


Average Co-Inventor Count = 1.6

ph-index = 4

Forward Citations = 38(Granted Patents)


Location History:

  • Eindhoven, NL (2017)
  • Veldhoven, NL (2018 - 2021)
  • Santa Clara, CA (US) (2021 - 2023)

Company Filing History:


Years Active: 2017-2023

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9 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Martijn Petrus Christianus Van Heumen:

Title: Inventor Spotlight: Martijn Petrus Christianus Van Heumen

Introduction:

Martijn Petrus Christianus Van Heumen is a prolific inventor based in Veldhoven, Netherlands, known for his innovative contributions to the field of charged particle beam technology. With a total of 9 patents to his name, Van Heumen has made significant advancements in thermal conditioning and cooling systems for wafer inspection apparatus.

Latest Patents:

1. System and methods for thermally conditioning a wafer in a charged particle beam apparatus: Van Heumen's patented system focuses on improving particle beam inspection apparatus by incorporating a thermal conditioning station. This station preconditions the temperature of a wafer before scanning it to measure various characteristics of the structures on the wafer.

2. Systems and methods of cooling objective lens of a charged-particle beam system: Another groundbreaking patent by Van Heumen involves the cooling of an objective lens in a charged-particle beam system. This method efficiently absorbs heat generated by electromagnetic coils, ensuring optimal performance of the apparatus.

Career Highlights:

Martijn Petrus Christianus Van Heumen is a valued member of the team at ASML Netherlands B.V., a leading company in the semiconductor industry. His expertise in charged particle beam technology has led to the successful development and implementation of cutting-edge systems for wafer inspection and analysis.

Collaborations:

Van Heumen has collaborated closely with talented individuals in his field, including Jeroen Gerard Gosen and Dennis Herman Caspar Van Banning. Together, they have worked on various projects that have pushed the boundaries of innovation in charged particle beam technology.

Conclusion:

In conclusion, Martijn Petrus Christianus Van Heumen stands out as a pioneering inventor in the realm of thermal conditioning and cooling systems for charged particle beam apparatus. His dedication to advancing technology and his collaborative efforts have significantly contributed to the evolution of wafer inspection methods. Van Heumen's patents continue to inspire further developments in the semiconductor industry, making him a notable figure in the world of innovation.

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