The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Nov. 14, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventor:
Martijn Petrus Christianus Van Heumen, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H05G 2/00 (2006.01); H01J 61/04 (2006.01); H01J 61/52 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G03F 7/70016 (2013.01); G03F 7/70191 (2013.01); G03F 7/70616 (2013.01); H01J 61/045 (2013.01); H01J 61/523 (2013.01); H01J 61/526 (2013.01);
Abstract
A radiation source apparatus comprising: a container comprising walls for defining a space for containing a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation; and a thermal load applicator adapted to apply a thermal load to at least part of the walls of the container to reduce stresses in the walls.