Feldkirch, Austria

Markus Esselbach

This inventor holds 3 USPTO granted patents and 5 published patent applications, plus 1 CIPO patent and 4 EPO patents. Top assignees: Oerlikon Surface Solutions Ag, Pfaffikon, Oerlikon Trading Ag, Trubbach, Oerlikon Trading Ag, Truebbach. Active years: 2011-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Esselbach. Retrieved from https://idiyas.com/inventor/markus-esselbach

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0


 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2011-2021

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3 patents (USPTO):Explore Patents

Title: Innovations of Markus Esselbach

Introduction

Markus Esselbach is a notable inventor based in Feldkirch, Austria. He has made significant contributions to the field of material processing, particularly in the area of evaporation and ion-etching technologies. With a total of 3 patents to his name, his work has advanced the efficiency and safety of various manufacturing processes.

Latest Patents

One of his latest patents is a "Target assembly for safe and economic evaporation of brittle materials." This invention discloses a target assembly that allows for safe, fracture-free, and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes and sputtering processes. The assembly includes a target with a first bayonet lock and a target holding device that features a counterbody for the first bayonet lock and a second bayonet lock for engaging the target assembly in the cooling means of the deposition chamber.

Another significant patent is the "Method for manufacturing workpieces with ion-etched surface." In this invention, planetary carriers for workpieces are mounted on a carousel within a vacuum chamber. A source for a cloud comprising ions is provided, ensuring that the central axis of the cloud intercepts the rotary axis of the carousel. The cloud has an ion density profile that drops to 50% of the maximum ion density at a specific distance, allowing for efficient etching of workpieces without redeposition of material on neighboring carriers.

Career Highlights

Throughout his career, Markus has worked with several prominent companies, including Oerlikon Trading AG and Oerlikon Surface Solutions AG. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in surface technology.

Collaborations

Markus has collaborated with notable coworkers such as Siegfried Krassnitzer and Martin Zaech. Their combined expertise has fostered advancements in their respective fields.

Conclusion

Markus Esselbach's contributions to the field of material processing through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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