The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Nov. 10, 2005
Markus Esselbach, Feldkirch, AT;
Martin Zaech, Balzers, LI;
Orlaw Massler, Eschen, LI;
Martin Grischke, Schaan, LI;
Markus Esselbach, Feldkirch, AT;
Martin Zaech, Balzers, LI;
Orlaw Massler, Eschen, LI;
Martin Grischke, Schaan, LI;
Oerlikon Trading AG, Trubbach, Trubbach, CH;
Abstract
A vacuum treatment system () for treating workpieces has a treatment chamber () that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (') is designed so that when uncovered, the distance between the shutter () and the target () is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target () is turned off.