Mark F Eaton

Title: Mark F Eaton: Innovator in EUV and X-ray Technologies

Introduction

Mark F Eaton, an accomplished inventor based in Austin, TX, has made significant contributions to the fields of extreme ultraviolet (EUV) and soft X-ray (SXR) technologies. With nine patents to his name, Eaton continues to push the boundaries of innovation, creating systems that enhance efficiency and performance in semiconductor applications.

Latest Patents

Among his latest innovations are two noteworthy patents. The first, titled "Multi-cathode EUV and soft x-ray source," introduces an efficient source that utilizes multiple electron beams from various cathodes. These e-beams impact a wide anode target featuring a flux-generating surface, enabling the generation of flux over a large area. This invention improves the conversion efficiency of e-beam power to flux power by strategically directing e-beams towards the anode target at shallow angles, alongside the use of mirrored surfaces to enhance flux reflection. This system operates within a vacuum chamber, performing vital tasks such as penetrating photoresist on semiconductor wafers.

The second patent, known as the "Forward flux channel X-ray source," details a unique method of producing x-ray flux. In this design, e-beams impact the inner walls of narrow channels formed within a metal anode, ensuring that most electrons reach the upper portion of these channels. This design allows electrons to ricochet down the channel, generating x-rays until the energy of the beam is depleted. By utilizing a single channel or an array of channels, the system can create parallel collimated beams of high-power efficiency x-rays.

Career Highlights

Eaton has worked with several innovative companies throughout his career, including Stellarray, Incorporated. His work consistently emphasizes enhancing technological capabilities in the fields of semiconductor manufacturing and radiation applications.

Collaborations

Mark F Eaton has collaborated with notable colleagues, including Leonid Danielovitch Karpov and Leonid D Karpov. Their collective efforts contribute to advancing research and development in EUV and SXR technologies, underscoring the collaborative nature of innovation.

Conclusion

Mark F Eaton stands out as an influential inventor in the domains of EUV and SXR technologies. Through his nine patents and extensive career, he has demonstrated a commitment to enhancing efficiency in semiconductor applications. His innovations are pivotal in shaping the future of these industries, and his collaborations with other esteemed professionals further amplify the impact of his work.