The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2016

Filed:

Mar. 15, 2014
Applicants:

Mark F Eaton, Austin, TX (US);

Mark Lucente, Austin, TX (US);

Inventors:

Mark F Eaton, Austin, TX (US);

Mark Lucente, Austin, TX (US);

Assignee:

STELLARRAY, INC., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01); G21K 1/02 (2006.01);
U.S. Cl.
CPC ...
H01J 35/08 (2013.01); G21K 1/02 (2013.01); H01J 2235/086 (2013.01); H01J 2235/18 (2013.01);
Abstract

This invention provides a source of x-ray flux in which x-rays are produced by e-beams impacting the inner walls of holes or channels formed in a metal anode such that most of the electrons reaching the channel impact an upper portion of said channel. A portion of the electrons from this primary impact will generate x-rays. Most of the electrons scatter but they continue to ricochet down the channel, most of them generating x-rays, until the beam is spent. A single channel source of high power efficiency and high power level x-rays may be made in this way, or the source can be of an array of such channels, to produce parallel collimated flux beams of x-rays.


Find Patent Forward Citations

Loading…