Burnet, TX, United States of America

Mark A Biscotto


Average Co-Inventor Count = 7.2

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2014-2017

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3 patents (USPTO):

Title: Mark A Biscotto: Innovator in Microelectronic Device Technology

Introduction

Mark A Biscotto is a notable inventor based in Burnet, Texas, who has made significant contributions to the field of microelectronics. With a total of three patents to his name, Biscotto has focused on developing compositions and methods that enhance the efficiency of microelectronic devices.

Latest Patents

Biscotto's latest patents revolve around the selective removal of silicon nitride materials. His innovative compositions are designed to effectively remove silicon nitride relative to polysilicon, silicon oxide materials, and silicide materials from microelectronic devices. The removal compositions include fluorosilicic acid, silicic acid, and at least one organic solvent. Typical process temperatures for these methods are less than about 100°C, with a selectivity for nitride versus oxide etch ranging from about 200:1 to about 2000:1. Under standard process conditions, nickel-based silicides, as well as titanium and tantalum nitrides, remain largely unaffected, while polysilicon etch rates are maintained at less than about 1 μm/min.

Career Highlights

Throughout his career, Biscotto has worked with prominent companies in the microelectronics sector, including Advanced Technology Materials, Inc. and Entegris, Inc. His experience in these organizations has allowed him to refine his expertise and contribute to advancements in microelectronic technologies.

Collaborations

Biscotto has collaborated with notable professionals in the field, including Emanuel Israel Cooper and Eileen Sparks. These partnerships have further enriched his work and innovation in microelectronic device technology.

Conclusion

Mark A Biscotto stands out as an influential inventor in the microelectronics industry, with a focus on improving the efficiency of device manufacturing through his patented methods. His contributions continue to shape the future of microelectronic technologies.

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