Jena, Germany

Mario Laengle

USPTO Granted Patents = 8 

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Weimar, DE (2014 - 2015)
  • Jena, DE (2016 - 2023)

Company Filing History:


Years Active: 2014-2024

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8 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Mario Laengle

Introduction

Mario Laengle is a distinguished inventor based in Jena, Germany. He has made significant contributions to the field of optical systems, holding a total of 8 patents. His work focuses on methods and devices that enhance the precision and efficiency of optical measurements and microlithography.

Latest Patents

Among his latest patents is a method for reproducing a target wavefront of an imaging optical production system. This innovative optical measuring system is designed to reproduce a target wavefront when an object is illuminated with illumination light. The system includes a displaceable object holder and at least one optical component, both controlled by actuator means. The method involves specifying a starting actuator position set and determining an expected design wavefront. A coarse measurement of the actual wavefront is conducted, followed by adjustments to achieve a fine target wavefront with minimal deviation from the design wavefront.

Another notable patent is a device for measuring masks for microlithography, which includes an imaging device and an autofocusing device. The imaging device features an optical unit with a focal plane for imaging the mask, along with a movement module for relative movement between the object stage and the imaging optical unit. The autofocusing device generates a focusing image by imaging a focusing structure, enhancing the accuracy of mask measurements.

Career Highlights

Mario Laengle has worked with prominent companies in the optical industry, including Carl Zeiss SMT GmbH and Carl Zeiss AG. His experience in these organizations has allowed him to develop and refine his innovative ideas in optical technology.

Collaborations

Throughout his career, Laengle has collaborated with notable colleagues such as Holger Seitz and Ulrich Matejka. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Mario Laengle's contributions to optical systems and microlithography demonstrate his commitment to innovation in the field. His patents reflect a deep understanding of optical technology and its applications, making him a significant figure in the industry.

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