Mao-Nan Chang

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: National Applied Research Laboratories. Active years: 2005-2018.

USPTO Granted Patents = 6 (Patent Applications = 1)

% Patents Active = 33.3

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 28(Granted Patents)

Location History:

Taichung, TW (2016)
Hsinchu, TW (2005 - 2018)
Taipei, TW (2018)

Company Filing History:

6 out of 240

National Applied Research Laboratories

patents

Years Active: 2005-2018

Loading Chart...

6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10026620 - Method of irradiating ultraviolet light on silicon substrate surface for improving quality of native oxide layer and apparatus using the same (2018-07-17),

2. 9861975 - Visible light response catalyst structure and process for manufacturing the same (2018-01-09),

3. 9255944 - Tip structure of platinum-platinum silicide-silicon composite field sensor probe and method for forming MSTA strucutre on the probe (2016-02-09),

4. 7210340 - Front-wing cantilever for the conductive probe of electrical scanning probe microscopes (2007-05-01),

5. 7193424 - Electrical scanning probe microscope apparatus (2007-03-20),

6. 6975129 - Electrical scanning probe microscope apparatus (2005-12-13),

Title: Mao-Nan Chang: Innovator in Silicon Substrate Technology

Introduction

Mao-Nan Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the improvement of silicon substrate surfaces. With a total of six patents to his name, Chang's work focuses on enhancing the quality of native oxide layers and developing efficient photocatalyst structures.

Latest Patents

Chang's latest patents include a method of irradiating ultraviolet light on silicon substrate surfaces to improve the quality of native oxide layers. This innovative approach effectively enhances the surface treatment of cross-section samples for scanning capacitance microscopy (SCM). By utilizing deep ultraviolet (UV) light, the quality of the native oxide layer is significantly improved, leading to better life cycle and reliability of samples. Additionally, he has developed a visible light response photocatalyst structure that boasts a large surface area and high surface activity, making it suitable for integration with silicon substrates.

Career Highlights

Mao-Nan Chang is affiliated with the National Applied Research Laboratories, where he continues to push the boundaries of semiconductor research. His work has not only advanced the understanding of silicon substrate technology but has also contributed to practical applications in various industries.

Collaborations

Chang has collaborated with notable colleagues, including Chun-Ting Lin and Ming-Hua Shiao, to further enhance the impact of his research and innovations.

Conclusion

Mao-Nan Chang's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in silicon substrate applications and photocatalyst structures.