The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2016

Filed:

Mar. 23, 2015
Applicant:

National Applied Research Laboratories, Taipei, TW;

Inventors:

Chun-Ting Lin, Hsinchu, TW;

Ming-Hua Shiao, Hsinchu, TW;

Shu-Hung Tung, Taichung, TW;

Mao-Nan Chang, Taichung, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 70/14 (2010.01); G01Q 70/18 (2010.01);
U.S. Cl.
CPC ...
G01Q 70/18 (2013.01); G01Q 70/14 (2013.01);
Abstract

A platinum-platinum silicide modified silicon composite tip apex, and a method for forming the aforesaid tip apex are disclosed, where a metallic precursor solution and a silicon probe are reacted to form a local platinum nano-structure, which could be precisely controlled with local selectivity, and a local platinum silicide layer is formed between the platinum nano-structure and the silicon probe with an atmospheric microwave annealing (a-MWA) process conducted as well, largely enhancing the conductivity of the tip and spatial resolution of the field detection in field sensitive scanning probe microscopy. In addition to exemption from a stray-field effect and thus having better image quality, the platinum silicide-containing probe could more efficiently enhance the interfacial electron transfer efficiency as compared to the probe tip having only a platinum nano-structure, so that the probe could be applicable to a controlled conductive probe having high spatial resolution.


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