Mao-I Ting

Title: Innovations by Mao-I Ting in Semiconductor Fabrication

Introduction

Mao-I Ting is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding a total of 3 patents. His work focuses on improving processes and systems that enhance the efficiency and reliability of integrated circuit manufacturing.

Latest Patents

One of Mao-I Ting's latest patents is titled "Critical dimension statistical process control in semiconductor fabrication." This invention provides a method for analyzing process variations that occur during integrated circuit fabrication. Critical dimension data is collected for each layer of the integrated circuit fabrication process over a specified period. A shift indicator is calculated to indicate variations in the critical dimension data for each layer. Additionally, a machine drift significance indicator is calculated for each machine used in the fabrication process. This invention aims to identify at least one likely cause of variation in critical dimensions for each layer of the integrated circuit fabrication process.

Another notable patent is the "Bubble detection system for detecting bubbles in photoresist tube." This system is designed to detect bubbles in photoresist, which is crucial for maintaining the quality of semiconductor manufacturing. The system includes a photoresist tank, a buffer tank, a pump, and a bubble sensor. The bubble sensor is strategically placed between the buffer tank and the pump to detect any bubbles in the photoresist and outputs an alarm signal when bubbles are detected.

Career Highlights

Mao-I Ting is currently employed at Macronix International Co., Ltd., where he continues to innovate and develop new technologies in semiconductor fabrication. His expertise in the field has made him a valuable asset to the company.

Collaborations

Mao-I Ting has collaborated with several talented individuals, including Cheng-Yi Lin and Jia-Hau Tzeng. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Mao-I Ting's contributions to semiconductor fabrication through his innovative patents demonstrate his commitment to enhancing manufacturing processes. His work not only addresses current challenges but also paves the way for future advancements in the industry.