Company Filing History:

10 out of 4,892

Asml Netherlands B.v.

Years Active: 2002-2025

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12235411 - Mirror replacement system (2025-02-25),

2. 9217923 - Method of using an EUV mask during EUV photolithography processes (2015-12-22),

3. 9075316 - EUV mask for use during EUV photolithography processes (2015-07-07),

4. RE42338 - Capping layer for EUV optical elements (2011-05-09),

5. 7875863 - Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method (2011-01-25),

6. 7628865 - Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus (2009-12-08),

7. 7473917 - Lithographic apparatus and method (2009-01-06),

8. 7473916 - Apparatus and method for detecting contamination within a lithographic apparatus (2009-01-06),

9. 6985211 - Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask (2006-01-10),

10. 6777140 - Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask (2004-08-17),

11. 6738188 - Multilayer extreme ultraviolet mirrors with enhanced reflectivity (2004-05-18),

12. 6724462 - Capping layer for EUV optical elements (2004-04-20),

13. 6449086 - Multilayer extreme ultraviolet mirrors with enhanced reflectivity (2002-09-10),

Title: Inventor Spotlight - Mandeep Singh: Pioneering Innovations in EUV Photolithography

Introduction:

Mandeep Singh, a prolific inventor based in Delft, Netherlands, has made significant contributions to the field of EUV photolithography with a total of 12 patents under his belt. His cutting-edge work in developing advanced EUV masks has garnered recognition and praise within the industry.

Latest Patents:

Among Mandeep Singh's latest patents is the groundbreaking "Method of using an EUV mask during EUV photolithography processes." This patent focuses on the design and functionality of EUV masks, featuring a unique multilayer stack comprised of ruthenium and silicon for enhanced performance during EUV light irradiation. Another notable patent is the "EUV mask for use during EUV photolithography processes," further showcasing his expertise in this specialized area.

Career Highlights:

Mandeep Singh has honed his craft while working at prestigious companies such as ASML Netherlands B.V. and GlobalFoundries Inc. His experience and expertise in EUV photolithography have been instrumental in pushing the boundaries of innovation in semiconductor manufacturing.

Collaborations:

Throughout his career, Mandeep Singh has collaborated with esteemed professionals in the field, including Hugo Matthieu Visser and Josephus Johannes Maria Braat. These partnerships have led to fruitful exchanges of ideas and have paved the way for groundbreaking developments in EUV technology.

Conclusion:

In conclusion, Mandeep Singh stands out as a trailblazer in the realm of EUV photolithography, with a strong track record of technological advancements and inventive solutions. His dedication to innovation and his collaborative spirit continue to shape the future of semiconductor manufacturing, making him a revered figure in the industry.

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