Makoto Tanigawa

Title: The Innovative Contributions of Makoto Tanigawa

Introduction

Makoto Tanigawa is a prominent inventor based in Kitakatsuragi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on methods that enhance the fabrication and performance of semiconductor devices.

Latest Patents

Tanigawa's latest patents include a "Method for forming a fine resist pattern" and a "Method of fabricating a semiconductor device having a triple well." The first patent outlines a process for creating a fine resist pattern on a semiconductor substrate, which involves several steps, including the formation of a resist layer and a phase-shifting pattern. The second patent describes a method for fabricating a semiconductor device that incorporates a p-type semiconductor substrate and a p-well for memory cells, detailing the selective oxidation and diffusion processes involved.

Career Highlights

Throughout his career, Tanigawa has been associated with Sharp Kabushiki Kaisha Corporation, where he has contributed to various innovative projects. His expertise in semiconductor technology has positioned him as a key figure in the industry, driving advancements that benefit both the company and the broader technological landscape.

Collaborations

Tanigawa has worked alongside notable colleagues, including Takayuki Taniguchi and Hiroki Tabuchi. Their collaborative efforts have furthered research and development in semiconductor technologies, leading to impactful innovations.

Conclusion

Makoto Tanigawa's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His innovative methods continue to influence the development of advanced semiconductor devices.