The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Feb. 11, 1992
Applicant:
Inventors:
Makoto Tanigawa, Nara, JP;
Shingo Okazaki, Nara, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437231 ; 437238 ;
Abstract
A manufacturing process for a semiconductor device comprising the following steps: to spin-coat by Spin-on method a solution for forming a SOG film on a wafer having a device formed on the surface to form a coating of the SOG film forming solute thereon; to treat by a liquid which is able to dissolve the solute for forming SOG film at least a part of the wafer which is held by claws of a dry etching system at a later stage in the series of processes, thereby removing a coating of the SOG film forming solute at that part; and to then bake the wafer to complete a SOG film.