Tokyo, Japan

Makoto Suyama


Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Kudamatsu, JP (2014)
  • Shunan, JP (2015 - 2016)
  • Tokyo, JP (2016 - 2018)

Company Filing History:


Years Active: 2014-2018

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9 patents (USPTO):Explore Patents

Title: Makoto Suyama: Innovator in Plasma Processing Technologies

Introduction

Makoto Suyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing, holding a total of 9 patents. His work focuses on advanced methods for etching and cleaning in semiconductor manufacturing.

Latest Patents

Suyama's latest patents include a plasma processing method and a plasma etching method. The plasma processing method involves forming a pattern of a mask on a laminated film of a magnetic film and a metal oxide film. This method includes steps such as plasma etching the magnetic film in a chamber and performing plasma cleaning using a gas mixture of chlorine element-containing gas and boron trichloride gas. The plasma etching method details a process for etching a sample that consists of multiple layers, including magnetic films and metal oxide films. This method utilizes carbon monoxide gas and a mixed gas of hydrogen gas and inactive gas for effective etching.

Career Highlights

Makoto Suyama is currently employed at Hitachi High-Technologies Corporation, where he continues to innovate in the field of plasma processing technologies. His expertise has led to advancements that are crucial for the semiconductor industry.

Collaborations

Suyama has collaborated with notable colleagues such as Naohiro Yamamoto and Masato Ishimaru. Their combined efforts contribute to the ongoing development of cutting-edge technologies in their field.

Conclusion

Makoto Suyama's work in plasma processing has established him as a key figure in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology.

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